XRF-Spectrometer LXRF-A10 is a microprocessor controlled high-count throughput unit with low detection limits for wide range of elements. Provision of multi-elemental analysis with detection limits upto 1 ppm. Built-in movable platform for easy location of testing point.High resolution detector improves analysis accuracy. Equipped with safety features of optical tube shielding with no X-ray radiation and high voltage emergency locking.
Movable sample platform for easy detection of testing point
Built-in electric cooling Si-PIN detector
Safety features - optical tube shielding with no X-ray radiation and high voltage emergency locking
Used in detection of plating thickness of metals, concentration of plating solution , RoHS detection and analysis, full-element analysis and electro plating industries
Optical typeCzerny turnerResolution≤ 0.015nm (3600 line grating) ≤ 0.030nm (2400 line grating)Focal length1000 mmGrating specificationshuge holographic grating with 3600 L/mil or 2400 L/mil and 80 mm × 100 mm of ruling areaWavelength range195 to 500 nm for 3600 line grating 195 to 800 nm for 2400 line grating
Solid State Power Specifications
Frequency27.12 MHz Frequency stability: < 0.05%Spray chamberScott double pass spray chamberOutput power800 W to 1600 W, adjustable with power efficiency more than 65%Output power stability≤ 0.05%Induction coil25 mm × 3 ID (ID-internal diameter), equipped with three concentric quartz torch tubes 35 mm ED (ED-external diameter)
Technical Specifications
Suitable sample content rangeLiquid sample: 0.01 ppm to several thousand ppm Solid or power sample: 0.001% to 70%Repeatabilityshort-term stability- RSD ≤ 1.5% Long-term stability: RSD ≤ 2%Test speed5 to 8 elements / minLimits of detection (LOD, µg/L) for most elements1ppb to 10ppb